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Algorithmic approaches to improving resolution in photolithography
Computational lithography (also known as computational scaling) is the set of mathematical and algorithmic approaches designed to improve the resolution
Computational_lithography
Process in microfabrication
Photolithography (also known as optical lithography) is a process that uses light to transfer a pattern onto a photoresist layer deposited on a sample
Photolithography
Novel photolithoghaphic techniques
self-assembly or aggressive cut reduction. Computational lithography Nanolithography Quantum lithography Tallis, Anton Shilov, Billy. "Samsung Starts
Next-generation_lithography
Photomask enhancement technique
In semiconductor device fabrication, the inverse lithography technology (ILT) is an optical proximity correction approach to optimize photomask design
Inverse_lithography
American technology company
company Ambios Technology, Inc. In 2014, the company acquired computational lithography and inspection company Luminescent Technologies, Inc. In 2017
KLA_Corporation
Photolithographic tool
other, at least one mask is required for each of these layers. Computational lithography Integrated circuit layout design protection (or "Mask work") Mask
Photomask
Photolithography enhancement technique
only approach the dense case, not match it. Computational lithography Phase-shift mask Inverse lithography Ronse, K. (1994). "Fundamental principles of
Optical_proximity_correction
Biological molecules for computations
ultimately result in the computational functionality of a computer. Biocomputers use biologically derived materials to perform computational functions. A biocomputer
Biological_computing
Three-dimensional imaging technique
proposed in the fields of holographic information and computational reduction as well as in computational and quantization techniques. The algorithms can be
Computer-generated_holography
Observation on the growth of integrated circuit capacity
generation of chips. The cost of the tools, principally extreme ultraviolet lithography (EUVL), used to manufacture chips doubles every 4 years. Rising manufacturing
Moore's_law
increase and the product turn around time grow longer as well. Computational lithography GDSII Tracy, Dan; Deborah Geiger (April 14, 2014). "SEMI Reports
Mask_shop
Materials used to create works of art
Vellum Wall Wood Aquatint Collotype Engraving Etching Intaglio Linocut Lithography Mezzotint Monotype Screen-printing Wood engraving Woodcut Bone Bronze
List_of_art_media
Potential hard disk technology
be written on tracks with predetermined shapes, which are created by lithography (see below) on the disk. The trajectories that are required to be followed
Patterned_media
Thin slice of semiconductor used for the fabrication of integrated circuits
Cost for processes such as lithography is proportional to wafer area, and larger wafers would not reduce the lithography contribution to die cost. Nikon
Wafer_(electronics)
Printing technology
548923. S2CID 110913847. Retrieved 19 October 2016. "Calibre Computational Lithography". Mentor Graphics. Archived from the original on 2016-05-31. Retrieved
Resolution enhancement technology
Resolution_enhancement_technology
Photo-optical Instrumentation Engineers (SPIE), for achievements in computational lithography, digital, biomedical, and electronic imaging. 2013 - Optical Society
Edmund_Lam
File format for 3D printing and scanning
(STereoLithography) File Format Family". Library of Congress. Archived from the original on 29 May 2022. Retrieved 30 May 2022. StereoLithography Interface
STL_(file_format)
Superconducting qubit implementation
the two lowest eigenstates will serve as the computational basis for the logical qubit. Computational operations are performed by pulsing the qubit with
Flux_qubit
Technology with features near one nanometer
techniques of lithography, such as optical lithography, X-ray lithography, dip pen lithography, electron beam lithography or nanoimprint lithography offer top-down
Nanotechnology
US research facility
Facility Director Adam Schwartzberg and founded by Jeff Bokor. Advanced lithography and thin-film processing emphasizing integration with chemical and biological
Molecular_Foundry
GPU microarchitecture designed by Nvidia
limit in semiconductor fabrication is the maximum size of features that lithography machines can etch into a silicon die. Previously, Nvidia had nearly hit
Blackwell_(microarchitecture)
American multinational computational software company
(stylized as cādence) is an American multinational technology and computational software company headquartered in San Jose, California. Initially specialized
Cadence_Design_Systems
Phenomenon in offset lithography
increase, is a phenomenon in physical printing processes including offset lithography, flexography and gravure that causes printed material to look darker
Dot_gain
Chemical compound
cathodes are used include electron microscopes, microwave tubes, electron lithography, electron beam welding, X-ray tubes, free electron lasers and several
Lanthanum_hexaboride
Creating an integrated circuit by combining many transistors into a single chip
for dealing with effects of variation. Stricter design rules – Due to lithography and etch issues with scaling, design rule checking for layout has become
Very-large-scale_integration
Simultaneous absorption of two photons by a molecule
more sensitive resins/resists, two-photon absorption found its way into lithography. One of the most distinguishing features of two-photon absorption is
Two-photon_absorption
MOS field-effect transistor with more than one gate
gating High-κ dielectric Next-generation lithography Extreme ultraviolet lithography Immersion lithography Strain engineering Very large scale integration
Multigate_device
Set of basic shapes which assemble into a polygon
represented as polygons, and one approach to preparation for electron-beam lithography is to decompose these polygon regions into fundamental figures. Polygon
Polygon_partition
American engineer (1949–2021)
monograph, Computational Electrodynamics: The Finite-Difference Time-Domain Method. In 1998, he edited the research monograph, Advances in Computational Electrodynamics:
Allen_Taflove
Physicist
Malvin Carl Teich is an American electrical engineer, physicist, and computational neuroscientist which is professor emeritus of electrical engineering
Malvin_Carl_Teich
Bug in the Intel P5 Pentium floating-point unit
Mathisen, T.; Moler, C.; Pratt, V. (1995). "Computational aspects of the Pentium affair" (PDF). IEEE Computational Science and Engineering. 2 (1): 18–30. doi:10
Pentium_FDIV_bug
Depiction made by an artist
used relief etching. By the early 19th century, the introduction of lithography substantially improved reproduction quality. In Europe, notable figures
Illustration
American physicist, academic and researcher (1944–2024)
peer-reviewed research papers and holds six patents in the fields of lithography and laser processing. His graduate textbook, Electromagnetic Radiation
Richard_R._Freeman
Chinese fabless semiconductor manufacturing company, fully owned by Huawei
"China Makes First DUV Lithography Machine: Supply Independence, Not New Nodes". Retrieved 31 July 2026. "China's DUV lithography is real now. It just isn't
HiSilicon
Quantum computing implementation
of the computational subspace) of a pair of coupled superconducting circuits can be used to induce a geometric phase on one of the computational states
Superconducting quantum computing
Superconducting_quantum_computing
Additive process used to make a 3D object
powder bed fusion, binder jetting, stereolithography, computed axial lithography, liquid alternative, lamination, directed energy deposition, selective
3D_printing
Wire with a diameter in the nanometres
a large piece of material to small pieces, by various means such as lithography, milling or thermal oxidation. A bottom-up approach synthesizes the nanowire
Nanowire
Dutch physicist (born 1972)
interferometric optical lithography. His research specializations include linear optical implementations of quantum communication and computation protocols, quantum
Pieter_Kok
Printing process
during the early 1890s. The development of halftone printing methods for lithography appears to have followed a largely independent path. In the 1860s, A
Halftone
Elementary particle with negative charge
such as cathode ray tubes, electron microscopes, electron beam welding, lithography, and particle accelerators that generate synchrotron radiation. Electrons
Electron
Light microscopy technique
compensate for temperature induced changes in refractive index. Immersion lithography Index-matching material Solid immersion lens Water immersion objective
Oil_immersion
Hexagonal lattice made of carbon atoms
monolayer graphene-hBN structures have been successfully synthesized via lithography patterning coupled with chemical vapor deposition (CVD). Furthermore
Graphene
Early photographic technique
and made improvements to the velocipede, as well as experimenting with lithography and related processes. Their correspondence reveals that Niépce was at
Daguerreotype
South Korean mechanical engineer and academic
as lenses, holograms, displays and sensors, together with nanoimprint lithography processes for manufacturing them at scale. In 2023 Rho's group reported
Junsuk_Rho
Academic field concerned with collection and analysis of information
contexts: digital humanities, computational social science, social media analytics, social informatics, computational linguistics Spatial information:
Information_science
Type of single-photon detector
infra-red photons. This is important because optical lithography rather than electron lithography can be used in their construction. This reduces the cost
Superconducting nanowire single-photon detector
Superconducting_nanowire_single-photon_detector
associated optical data storage can be increased. Similar to immersion lithography, the use of SIL can increase spatial resolution of projected photolithographic
Solid_immersion_lens
Japanese computer scientist
an initial configuration with only one active cell. In electron beam lithography, Goto's work included the development of double deflection tubes and
Eiichi_Goto
Printing technology and system based on reconfigurable blocks of glyphs
ISBN 978-1-351-88834-9. Agüera y Arcas, Blaise; Paul Needham (November 2002). "Computational analytical bibliography". Proceedings Bibliopolis Conference The future
Movable_type
Software for designing electronic systems
beneficial changes. Mask data preparation or MDP - The generation of actual lithography photomasks, utilised to physically manufacture the chip. Chip finishing
Electronic_design_automation
result in the computational complexity of quantum computers, proving that they were capable of performing some well-defined computation more efficiently
Timeline of quantum computing and communication
Timeline_of_quantum_computing_and_communication
Research and scientific development company
devised his quantum factorization algorithm. In 1996, SCALPEL electron lithography, which prints features atoms wide on microchips, was invented by Lloyd
Bell_Labs
Position data for CNC milling machines
"Numerical control machining of triangulated sculptured surfaces in a stereo lithography format with a generalized cutter". International Journal of Production
Cutter_location
relative humidity of the atmosphere. The development of nanometer-scale lithographies is the focus of an intense research activity because progress on nanotechnology
Local oxidation nanolithography
Local_oxidation_nanolithography
Means of studying the interaction of light and matter
qubits have evolved to include advanced methods such as electron beam lithography, shadow evaporation for creating ultra-clean Josephson junctions, and
Circuit quantum electrodynamics
Circuit_quantum_electrodynamics
Physical implementation of an artificial neural network with optical components
recently been introduced into diffractive neural network by fs laser lithography of perovskite hydration. The temporal behaviour of the neuron can be
Optical_neural_network
Microprocessor model
Corporation, Microcomputer Solutions, July/August 1988, page 18 "1.5 μm lithography process - WikiChip". en.wikichip.org. Archived from the original on September
Intel_80286
Periodic optical nanostructure that affects the motion of photons
visible range photonic crystals by Sato et al. in 2002, uses electron-beam lithography and dry etching: lithographically formed layers of periodic grooves are
Photonic_crystal
Type of transmissive optical device
technologies such as evanescent near-field lithography, near-field interference lithography, and phase-shifting mask lithography were developed to overcome the diffraction
Superlens
Process of calculating the causal factors that produced a set of observations
function for some models. Important computational effort can be saved when we can avoid the very heavy computation of the Jacobian (often called "Fréchet
Inverse_problem
Type of interface
(proximal probe methods, nano-and micro contact methods, e-beam and X-ray lithography, and bottom up self-assembly methods), scientists who have developed
Biointerface
Simulation software
quantum-dot microlenses utilizing three-dimensional in situ electron-beam lithography". Nat. Commun. 6: 7662. arXiv:1312.6298. Bibcode:2015NatCo...6.7662G
JCMsuite
Award
Lyding University of Illinois at Urbana–Champaign Hydrogen depassivation lithography using scanning tunneling microscopes 2015 Michelle Y. Simmons University
Feynman Prize in Nanotechnology
Feynman_Prize_in_Nanotechnology
Type of artificial sheet material
the ultrathin metallic layers, perfect imaging and super-resolution lithography could be possible, which breaks the common assumption that all optical
Electromagnetic_metasurface
AMD compute-focused GPU microarchitecture
(December 14, 2022). "Samsung Soups Up 96 AMD MI100 GPUs With Radical Computational Memory". Tom's Hardware. Retrieved December 23, 2022. "AMD Instinct
CDNA_(microarchitecture)
German multinational science and technology company
every major production step in the wafer processing, including doping, lithography, patterning, deposition, planarization, etching, and cleaning. After
Merck_Group
American control theorist
Control. Krstić has contributed to technologies in extreme ultraviolet lithography, advanced arresting gear for Ford-class carriers, laser spectroscopy
Miroslav_Krstić
Term in mesoscopic physics
range of dimensions is routinely reached for example by electron beam lithography and appropriate pattern transfer technologies, like the Niemeyer–Dolan
Coulomb_blockade
Force resulting from the quantisation of a field
measure the Casimir force. The integrated chip defined by electron-beam lithography does not need extra alignment, making it an ideal platform for measuring
Casimir_effect
Overview of and topical guide to nanotechnology
Nanolithography – Electron beam lithography – Ion-beam sculpting – Nanoimprint lithography – Photolithography – Scanning probe lithography – Molecular self-assembly
Outline_of_nanotechnology
Study of classical optics using Fourier transforms
photoresist on a wafer. As a result, machines realizing such an optical lithography have become more and more complex and expensive, significantly increasing
Fourier_optics
Using wave optics to reproduce a three-dimensional light field
output to a transparency, spatial light modulator (SLM), or fabricated by lithography. When illuminated, the CGH reconstructs the desired wavefront, producing
Holography
Architecture school of Cornell University
the Department of Art. It houses painting, drawing, photography and lithography studios, the Art department main office and faculty offices. Rand Hall
Cornell University College of Architecture, Art, and Planning
Cornell_University_College_of_Architecture,_Art,_and_Planning
San Francisco-based venture capital firm
Positron AI. Substrate: founded by James Proud, the startup develops X-ray lithography (instead of the EUV method) for chip production. In October 2025, Substrate
Founders_Fund
Art developed primarily for aesthetics
Japanese ukiyo-e style is the most important. The 19th-century invention of lithography and then photographic techniques have partly replaced the historic techniques
Fine_art
computation, such as dense lattices of nanocomputers or quantum dot cellular automata. Contelligence The combination of awareness and computational power
Glossary_of_nanotechnology
development of advanced understanding of differential equations and computational methods. Significant theoretical contributions were made by notables
History_of_fluid_mechanics
Electronic non-volatile computer storage device
percent less power. They offer comparable physical bit density using 10-nm lithography but may be able to increase bit density by up to two orders of magnitude
Flash_memory
American scientist and engineer
challenges". CNET News. Retrieved June 4, 2015. Moore, Gordon E. (1995). "Lithography and the future of Moore's law" (PDF). SPIE. Retrieved May 27, 2014. Brock
Carver_Mead
Federal research center in California, US
WMD proliferation and terrorism. Development of extreme ultraviolet lithography (EUVL) for fabricating next-generation computer chips. First-ever detection
Lawrence Livermore National Laboratory
Lawrence_Livermore_National_Laboratory
Nanoelectronics conference
President/Chief Technical Officer of ASML N.V., discussed the importance of EUV lithography, and Kazu Ishimaru, Senior Fellow at Kioxia, discussed the future of
International Electron Devices Meeting
International_Electron_Devices_Meeting
Solid metallic material with disordered atomic-scale structure
on scales as small as 10 nm. This may solve problems of nanoimprint lithography where silicon nano-molds are expensive and break easily. Nano-molds made
Amorphous_metal
Obsolete type of non-volatile computer memory
adjacent elements, that is 2/3 the bubble diameter and reduces demands on lithography resolution. X bar propagation elements, shaped like the letter X, as
Bubble_memory
Nano-scale semiconductor particles
and a lateral pattern is then defined in the resist by electron-beam lithography. This pattern can then be transferred to the electron or hole gas by
Quantum_dot
American physicist (born 1965)
spin in semiconductor heterostructure. Development of conductive-AFM lithography for extreme nanoscale control of the metal-insulator transition in LaAlO3/SrTiO3
Jeremy_Levy
Inorganic compound
component in the "resist stripper", which removes photoresist after lithography. Hydroxylamine and its salts are commonly used as reducing agents in
Hydroxylamine
Superconducting qubit implementation
devices are usually made on silicon or sapphire wafers using electron beam lithography (different from phase qubit, which uses photolithography) and metallic
Charge_qubit
Emission of electrons induced by an electrostatic field
F. (2017). "A general computational method for electron emission and thermal effects in field emitting nanotips". Computational Materials Science. 128:
Field_electron_emission
Ionized gas-generating "pinch" machine
applications as a soft X-ray source for next-generation microelectronics lithography, surface micromachining, pulsed X-ray and neutron source for medical
Dense_plasma_focus
high-performance computing. While at DuPont he worked on semiconductor lithography, phase shift masks, pellicles, and photoresists, registering multiple
Roger_H._French
Chinese science award
2018 Burn-Jeng Lin National Tsing Hua University "pioneering immersion lithography to continuously scale nano-metric integrated circuit fabrication, reviving
Future_Science_Prize
produced when he was State Geologist. For the 1833 edition, Pendleton's Lithography (Boston) lithographed nine of Hitchcock's Connecticut River Valley drawings
Timeline_of_women_in_science
Design and manufacture of artificial nucleic acid structures
acid structure, and schemes for using nucleic acid nanostructures as lithography masks, transferring their pattern into a solid surface. Dynamic DNA nanotechnology
DNA_nanotechnology
Impression Block LINCO – Liner and Completion Progress Report LIOG – Lithography Log LIT – Lead Impression Tool LIT – level indicator transmitter LITDE
List of abbreviations in oil and gas exploration and production
List_of_abbreviations_in_oil_and_gas_exploration_and_production
Science of measuring the shape, orientation, and gravity of Earth
ellipsoid, the geoid is irregular and too complicated to serve as the computational surface for solving geometrical problems like point positioning. The
Geodesy
Class of devices for nanoscale functionality
the traditional microfabrication methods, i.e. optical, electron-beam lithography and thermal treatments, to manufacture devices. While being limited by
Nanoelectromechanical_systems
Type of cellular automaton
state implementation achievable, but not necessarily practical. Serial lithography is slow, expensive and unsuitable for mass-production of solid-state
Quantum dot cellular automaton
Quantum_dot_cellular_automaton
Allotropes of carbon with a cylindrical nanostructure
miles. IMEC is using carbon nanotubes for pellicles in semiconductor lithography. In tissue engineering, carbon nanotubes have been used as scaffolding
Carbon_nanotube
American chemist (born 1959)
as one of the Breakthroughs of 2001 by Science. He also developed a lithography-free approach to bridging the macro-to-nano scale gap using modulation-doped
Charles_M._Lieber
decisive breakthrough in China was not the Gutenberg letterpress, but lithography, a nineteenth-century technological marvel almost wholly forgotten in
Science and technology of the Tang dynasty
Science_and_technology_of_the_Tang_dynasty
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