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Lithographic technique that uses a scanning beam of electrons
Electron-beam lithography (often abbreviated as e-beam lithography or EBL) is the practice of scanning a focused beam of electrons to draw custom shapes
Electron-beam_lithography
Novel photolithoghaphic techniques
any lithography method which uses a shorter-wavelength light or beam type than the current state of the art, such as X-ray lithography, electron beam lithography
Next-generation_lithography
Lithographic technique that uses a scanning ion beam
compared to x-ray and e-beam lithography. Ion-beam lithography, or ion-projection lithography, is similar to Electron beam lithography, but uses much heavier
Ion_beam_lithography
Lithographic technique that uses X-rays instead of light
prints. X-rays generate secondary electrons as in the cases of extreme ultraviolet lithography and electron beam lithography. While the fine pattern definition
X-ray_lithography
The proximity effect in electron-beam lithography (EBL) is the phenomenon that the exposure dose distribution, and hence the developed pattern, is wider
Proximity effect (electron beam lithography)
Proximity_effect_(electron_beam_lithography)
Lithography that does not use photomasks
used form of maskless lithography today is electron beam lithography. Its widespread use is due to the wide range of electron beam systems available accessing
Maskless_lithography
Elementary particle with negative charge
electron microscopes, electron beam welding, lithography, and particle accelerators that generate synchrotron radiation. Electrons belong to the first generation
Electron
Founder of Lam Research Corporation
Corporation (Santa Clara, CA), which manufactures complementary electron beam lithography (CEBL) systems. He also heads the David Lam Group, an investor
David_K._Lam
Process in microfabrication
as electron beam lithography, X-ray lithography, extreme ultraviolet lithography and ion projection lithography. Extreme ultraviolet lithography has
Photolithography
Electron-beam-induced deposition (EBID) is a process of decomposing gaseous molecules by an electron beam leading to deposition of non-volatile fragments
Electron beam-induced deposition
Electron_beam-induced_deposition
Technique for patterning photomasks
biotechnology. Electron interference lithography may be used for patterns which normally take too long for conventional electron beam lithography to generate
Interference_lithography
Lithography using 13.5 nm UV light
the pattern is defined on the photoresist using maskless lithography with an electron beam. This step is called exposure. The exposed photoresist is
EUV_lithography
Security label
holograms are created using highly sophisticated and very expensive electron-beam lithography systems. This kind of technology allows the creation of surface
Security_hologram
Used to create structures that only measure nanometers
20 nm resolution. Electron beam lithography (EBL) or electron-beam direct-write lithography (EBDW) scans a focused beam of electrons on a surface covered
Nanolithography
Beam of electrons observed in vacuum tubes
oscilloscopes. Today, electron beams are employed in sophisticated devices such as electron microscopes, electron beam lithography and particle accelerators
Cathode_ray
Device
either of the beams. FIB should not be confused with using a beam of focused ions for direct write lithography (such as in proton beam writing). These
Focused_ion_beam
Semiconductor technology
Electron beam lithography, using a steerable electron beam. Nanoimprinting Interference lithography Magnetolithography Scanning probe lithography Surface-charge
Microlithography
an American producer of scanning electron microscopes, electron beam lithography tools, and laser beam lithography tools from 1970 until 2005. It was
Etec_Systems
Emission of electrons induced by an electrostatic field
microscopes and other electron beam instruments (such as those used for electron beam lithography), it is helpful to start with an electron source that is small
Field_electron_emission
Very small devices that incorporate moving components
acts as a lens. Electron beam lithography (often abbreviated as e-beam lithography) is the practice of scanning a beam of electrons in a patterned fashion
MEMS
Printing technique
printing Electron-beam lithography Flexography German inventors and discoverers History of graphic design Lineography List of art techniques Proton beam writing
Lithography
Method of fabricating nanometer scale patterns using a special stamp
resolution template patterning can currently be performed by electron beam lithography or focused ion beam patterning; however at the smallest resolution, the
Nanoimprint_lithography
Device that controls current between electrodes
create a beam of electrons for display purposes (such as the television picture tube, in electron microscopy, and in electron beam lithography); X-ray
Vacuum_tube
High-energy, direct-write nano-lithography
Proton beam writing (or p-beam writing) is a direct-write lithography process that uses a focused beam of high-energy (MeV) protons to pattern resist
Proton_beam_writing
Topics referred to by the same term
resistance of a conductor Proximity effect (electron beam lithography), a phenomenon in electron beam lithography (EBL) Proximity effect (superconductivity)
Proximity_effect
American semiconductor designing company
nanometer-scale features are required. Complementary Electron Beam Lithography (CEBL) works with optical lithography to pattern cuts (of lines in "lines-and-cuts"
Multibeam_Corporation
Technology with features near one nanometer
techniques of lithography, such as optical lithography, X-ray lithography, dip pen lithography, electron beam lithography or nanoimprint lithography offer top-down
Nanotechnology
Light-sensitive material used in making electronics
photoresists for electron-beam exposure. Electron beam lithography usually relies on resists dedicated specifically to electron-beam exposure. Physical
Photoresist
Synthetic adhesive tape
on the surface of a 5 μm thick film of the same material using electron beam lithography and dry etching in an oxygen plasma. The fibres were 2 μm long
Nano_tape
Lithography technique
directly from other contact masks, or by direct writing (e.g., electron beam lithography). As noted above, thinner photoresist can help improve image contrast
Contact_lithography
Spatially localized group of electrically charged particles travelling in same direction
particle beams make them useful for many applications in particle physics (see Particle beam#Applications and Electron-beam technology). Such beams can be
Charged_particle_beam
Devices using beams of free electrons
cable-isolation treatment, in electron lithography of sub-micrometer and nano-dimensional images, in microelectronics for electron-beam curing of color printing
Electron-beam_technology
Type of transmissive optical device
limitation may be removed, and a new class of image generated. Electron beam lithography can overcome this resolution limit. Optical microscopy, on the
Superlens
Potential hard disk technology
first formed on a substrate that contains a photo-resist using electron beam lithography. Next the substrate is used to transfer the given pattern onto
Patterned_media
German physicist
contribution to the development of electron beam lithography. He is the original inventor of variable-shaped beam (VSB) electron-beam projection system while at
Hans_Pfeiffer
Overview of and topical guide to semiconductors
Photolithography Extreme ultraviolet lithography Immersion lithography Electron-beam lithography Nanoimprint lithography Photoresist Photomask Spin coating
Outline_of_semiconductors
Imaging Instrument
also use the STM to tunnel electrons into a layer of electron-beam photoresist on the sample, in order to do lithography. This has the advantage of offering
Scanning_tunneling_microscope
British electrical engineer
the National Academy of Engineering for contributions to electronic beam lithography and microscopy and for leadership in microfabrication. Broers was born
Alec_Broers,_Baron_Broers
Industrial and food chemical
is produced from the normal techniques of photolithography or electron-beam lithography. The resolution depends on the mask used and can reach 6 nm. The
Polydimethylsiloxane
American experimental physicist (1927–2013)
field of energy and has also been credited as an early pioneer of electron beam lithography, which has become a key mask-making technology for modern microelectronics
Kenneth_R._Shoulders
Photolithographic tool
generators have since been replaced by electron beam lithography and laser-driven mask writer or maskless lithography systems which generate reticles directly
Photomask
Force resulting from the quantisation of a field
can measure the Casimir force. The integrated chip defined by electron-beam lithography does not need extra alignment, making it an ideal platform for
Casimir_effect
Basket-shaped ring molecule able to store other molecules within itself
nanotechnology calixarenes are used as negative resist for high-resolution electron beam lithography. A tetrathia[4]arene is found to mimic some properties of the
Calixarene
Scanning probe lithography Thermochemical nanolithography Dip-pen nanolithography Atomic force microscopy Scanning probe microscopy Electron-beam lithography
Thermal scanning probe lithography
Thermal_scanning_probe_lithography
Inorganic compound
investigated as a negative resist in photolithography and electron-beam (e-beam) lithography. HSQ is commonly delivered in methyl isobutyl ketone (MIBK)
Hydrogen_silsesquioxane
American physicist, academic and researcher (1944–2024)
limitation projection electron-beam lithography (SCALPEL) principle to help design the proof-of-concept projection electron-beam lithography system and highlighted
Richard_R._Freeman
Type of very-high-resolution microscopy
precise positioning of the microSQUID loop is achieved using electron beam lithography. The additional attachment of a quantum dot to the tip apex of
Atomic_force_microscopy
Type of discharge tube
and is now used in sophisticated processes such as electron microscopes and electron beam lithography. When the voltage applied to a Crookes tube is high
Crookes_tube
White powder insoluble in water
conjunction with top down patterning methods such as electron beam lithography and nanosphere lithography to designate nucleation sites prior to growth. Aligned
Zinc_oxide
Term in mesoscopic physics
This range of dimensions is routinely reached for example by electron beam lithography and appropriate pattern transfer technologies, like the Niemeyer–Dolan
Coulomb_blockade
Techniques that create structures using stamps
over other forms of lithography (such as photolithography and electron beam lithography). They include the following: Lower cost than traditional photolithography
Soft_lithography
Type of laser diode
technologically difficult to achieve, and often requires directly written electron-beam lithography. Often, rather than a single quarter-wave phase shift at the center
Distributed-feedback_laser
Transparent thermoplastic, commonly called acrylic
semiconductor research and industry, PMMA aids as a resist in the electron beam lithography process. A solution consisting of the polymer in a solvent is
Poly(methyl_methacrylate)
State in Germany
represented with Bosch Thermotechnik and Viessmann. Vistec produces electron-beam lithography systems for semiconductor industry in Weilburg, also there is
Hesse
Technology for creating optical illusions
In some cases, electron beam lithography has been used instead. The curing of the ink was then initiated directly by an electron beam scanned across the
Lenticular_printing
fabrication tools for processes including electron-beam lithography, photolithography, chemical vapor deposition, electron-beam deposition and reactive ion etching
Cornell NanoScale Science and Technology Facility
Cornell_NanoScale_Science_and_Technology_Facility
American X-ray crystallographer
programmers who created FORTRAN, and later suggested the use of electron beam lithography for the fabrication of X-ray Fresnel zone plates. The International
David_Sayre
Biological molecules for computations
hardware from wafers where the channels are etched by electron-beam lithography or nano-imprint lithography. The channels are designed to have a high aspect
Biological_computing
Artificial dry adhesives
fabrication of synthetic setae, which include photolithography/electron beam lithography, plasma etching, deep reactive ion etching (DRIE), chemical vapor
Synthetic_setae
Japanese computer scientist
starting from an initial configuration with only one active cell. In electron beam lithography, Goto's work included the development of double deflection tubes
Eiichi_Goto
Artificial vacuum with very low pressure
the surface reconstruction of the unoxidized silicon surface. Electron-beam lithography Journal of Vacuum Science and Technology Orders of magnitude (pressure)
Ultra-high_vacuum
(electromagnetism) (electrical engineering) Proximity effect (electron beam lithography) (condensed matter physics) Proximity effect (superconductivity)
List_of_effects
interference lithography (LIL), electron beam lithography, and focused ion beam lithography. Several process are available using stencil lithography: material
Stencil_lithography
Technique used to increase the number of structures a microchip may contain
line-cutting at its 45 nm node or TSMC at its 28 nm node. Even for electron-beam lithography, single exposure appears insufficient at ~10 nm half-pitch, hence
Multiple_patterning
breakthroughs – after four years, the consortium had developed advanced electron-beam lithography techniques for chip fabrication, a leap that helped Japan produce
Semiconductor industry in Japan
Semiconductor_industry_in_Japan
Device that emits light via optical amplification
uses such as optical communication, laser cutting, and lithography. It also allows a laser beam to stay narrow over great distances (collimation), used
Laser
Process in microstructuring technology
various methods can be used, such as Extreme ultraviolet lithography - EUVL or Electron beam lithography - EBL. The photoresist is removed in the areas, where
Lift-off_(microtechnology)
Semiconductor manufacturing node
143 μm2 SRAM cell with a poly gate pitch of 135 nm, produced using electron-beam lithography and photolithography on the same layer. It was observed that the
32_nm_process
Nano-scale semiconductor particles
pattern is then defined in the resist by electron-beam lithography. This pattern can then be transferred to the electron or hole gas by etching, or by depositing
Quantum_dot
Algorithmic approaches to improving resolution in photolithography
shortening, correcting for electron beam proximity effects OPC can be broadly divided into rule-based and model-based. Inverse lithography technology, which treats
Computational_lithography
Type of ultraviolet laser important in chip manufacturing and eye surgery
Physical Institute in Moscow, using liquid xenon dimer (Xe2) excited by an electron beam. Spurred by this report, H.A. Koehler et al. presented a better substantiation
Excimer_laser
Electronic component
electron beam (e-beam) lithography. This process is slow and relatively expensive because parallel processing is not possible with e-beam lithography
Optical_rectenna
Photolithography enhancement technique
proximity effect correction in electron beam lithography is included as an automated capability on commercial electron-beam lithography tools. Since many non-lithographic
Optical_proximity_correction
Electron beam ion trap (EBIT) is an electromagnetic bottle that produces and confines highly charged ions. An EBIT uses an electron beam focused with a
Electron_beam_ion_trap
MOSFET technology node
device are difficult to achieve in a polymeric resist, even with electron beam lithography. In addition, the chemical effects of ionizing radiation also
14_nm_process
Chemical compounds containing the element lanthanum
are used as high-brightness electron sources in electron microscopes, electron-beam lithography systems and other electron-optical instruments. Cerium-doped
Lanthanum_compounds
Tool used in semiconductor fabrication
Division and put it on the market in April 1989, along with their electron-beam lithography (EBL) division. The EBL work quickly sold, but the aligner division
Micralign
Quantum computing implementation
use of electron-beam lithography, as opposed to optical lithographic techniques, which is hard to scale and has low yield. However, electron beams allow
Superconducting quantum computing
Superconducting_quantum_computing
Structure in some metamaterials
and nanofabrication techniques may utilize direct laser beam writing or electron beam lithography depending on the desired resolution. Split-ring resonators
Split-ring_resonator
or a scanning electron microscope (SEM). The rotor, electrodes and the 'in-plane' stators are patterned using electron beam lithography using an appropriately
Carbon_nanotube_nanomotor
Scanning probe lithographic technique
electron microscopy (SEM) and electron beam (e-beam) lithography. E-beam evolved directly from SEM technology, and both use a focused electron beam,
Dip-pen_nanolithography
Physicist
mesoscopic systems, magnetic nanostructures, nanoimprint and electron beam lithography as well as magnetic thin films and nanostructures. Her research
Laura_Heyderman
VLSI technology. V. A single-level polysilicon technology using electron-beam lithography". IEEE Journal of Solid-State Circuits. 14 (2): 275–281. Bibcode:1979IJSSC
List of semiconductor scale examples
List_of_semiconductor_scale_examples
Metamaterial that uses surface plasmons to achieve optical properties not seen in nature
depositing a thermoplastic, known as a PMMA, on a gold surface via electron beam lithography. Hyperbolic metamaterials behave as a metal when light passes
Plasmonic_metamaterial
Type of cyclic particle accelerator
saturation. Electron/positron accelerators may also be limited by the emission of synchrotron radiation, resulting in a partial loss of the particle beam's kinetic
Synchrotron
Chemical compound
water or isopropyl alcohol MIBK serves as a developer for PMMA electron beam lithography resist. MIBK is used as a solvent for CS in the preparation of
Methyl_isobutyl_ketone
Holography of electron waves
energy spread) of the electron beam is required to perform holographic measurements. Electron holography with high-energy electrons (80-200 keV) can be
Electron_holography
Ultraviolet light with a wavelength of 10–121nm
free-electron laser and table top EUV sources based on high harmonic generation techniques. First generation commercial systems for EUV lithography based
Extreme_ultraviolet
Molecular compound with applications in ceramics
"A novel silicon containing chemical amplification resist for electron beam lithography". Microelectronic Engineering. 13 (1–4): 69. doi:10.1016/0167-9317(91)90050-N
Silsesquioxane
Materials science and engineering professor
previously demonstrated that it is possible to use electrochemical electron-beam lithography to write, read and erase these nanocrystals. Two-dimensional materials
Frances_M._Ross
particles, such as the electron beams produced in scanning electron microscopes. This is the basis of electron-beam direct-write lithography. A resist is not
Resist (semiconductor fabrication)
Resist_(semiconductor_fabrication)
Tunneling diode
when even smaller RITDs are fabricated using techniques such as electron beam lithography. Integration of Si/SiGe RITDs with Si CMOS has been demonstrated
Resonant_tunneling_diode
ferroelectric and MMIC fabrication processes, do not require electron beam lithography, MBE, or MOCVD. Contact interface degradation poses a reliability
Radio-frequency microelectromechanical system
Radio-frequency_microelectromechanical_system
Semiconductor company
used include, among others, three-dimensional X-ray analysis, multi-beam electron beam inspection, and FIB-SEM-based three-dimensional imaging techniques
Carl_Zeiss_SMT
Chemical compound
cathodes are used include electron microscopes, microwave tubes, electron lithography, electron beam welding, X-ray tubes, free electron lasers and several types
Lanthanum_hexaboride
Obsolete type of non-volatile computer memory
were also used. The photolithography masks are created using electron beam lithography. Amorphous magnetic films were also considered as they had greater
Bubble_memory
Three-dimensional imaging technique
Hård S. (1990). "Multilevel Phase Holograms Manufactured by Electron-Beam Lithography". Opt. Lett. (OSA) 15 (10): 568-569. 0146-9592/90/100568-02$2
Computer-generated_holography
Schottky barrier solar cell
single cadmium selenide nanobelts-on-electrodes. This method uses electron-beam lithography, or EBL, which provides a more efficient synthesis method to developing
Schottky_junction_solar_cell
Fabrication technology used to create high-aspect-ratio microstructures
fashions. The most accurate and expensive masks are those created by electron-beam lithography, which provides resolutions as fine as 0.1 μm in resist 4 μm thick
LIGA
Overview of and topical guide to nanotechnology
Nanolithography – Electron beam lithography – Ion-beam sculpting – Nanoimprint lithography – Photolithography – Scanning probe lithography – Molecular self-assembly
Outline_of_nanotechnology
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