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Method that removes material, one 1-atom thick layer at a time
Atomic layer etching (ALE) is an emerging technique in semiconductor manufacture, in which a sequence alternating between self-limiting chemical modification
Atomic_layer_etching
Chemical processing technique
Single layer etching is a chemical processing technique that removes material one atomic or molecular layer at a time. Manufacturers apply the technique
Single_layer_etching
Thin-film deposition technique that deposits one 1-atom thick layer at a time
Atomic layer deposition (ALD) is a thin-film deposition technique based on the sequential use of a gas-phase chemical process; it is a subclass of chemical
Atomic_layer_deposition
thickness and uniformity. Atomic layer etching Single layer etching Atomic layer deposition Suntola, Tuomo (1 January 1989). "Atomic layer epitaxy". Materials
Atomic_layer_epitaxy
American semiconductor equipment company
during subsequent manufacturing steps. Applied Materials Atomic layer etching Single layer etching Wikimedia Commons has media related to Lam Research. "Lam
Lam_Research
Manufacturing process used to create integrated circuits
conductivity) Etching (microfabrication) Dry etching (plasma etching) Reactive-ion etching (RIE) Deep reactive-ion etching (DRIE) Atomic layer etching (ALE) Plasma
Semiconductor device fabrication
Semiconductor_device_fabrication
Chemical compound
Joseph, Eric A.; Oehrlein, Gottlieb S. (2014). "Fluorocarbon assisted atomic layer etching of SiO2 using cyclic Ar/C4F8 plasma". Journal of Vacuum Science &
Octafluorocyclobutane
Dutch information technology company
semiconductor manufacturers in fabrication plants for processes such as atomic layer deposition, epitaxy, chemical vapor deposition, and diffusion. The company
ASM_International
Vapour phase thin film deposition technique
manner. Essentially, MLD resembles the well established technique of atomic layer deposition (ALD) but, whereas ALD is limited to exclusively inorganic
Molecular_layer_deposition
sodium etching is defluorination of the PTFE, stripping the fluorine molecules from the carbon backbone of the polymer. The fluorine-to-carbon atomic ratio
Surface_treatment_of_PTFE
Topics referred to by the same term
Asymptotically locally Euclidean, a division of gravitational instanton Atomic layer etching, a technique in semiconductor device fabrication Automatic link establishment
Ale_(disambiguation)
Very small devices that incorporate moving components
the basic techniques are deposition of material layers, patterning by photolithography and etching to produce the required shapes. Silicon Silicon is
MEMS
Class of two-dimensional inorganic compounds
MXenes prepared via HF etching have an accordion-like morphology, which can be referred to as multi-layer MXene (ML-MXene), or few-layer MXene (FL-MXene) for
MXenes
Beam of charged atoms (ions)
modification (e.g. by sputtering or ion beam etching) and for ion beam analysis. Ion beam application, etching, or sputtering, is a technique conceptually
Ion_beam
American manufacturing company
deposition (MOCVD), wet wafer processing, molecular beam epitaxy (MBE), atomic layer deposition (ALD), physical vapor deposition (PVD), dicing and lapping
Veeco
prevention steps are applied. The oxide layer removal can be realized by various oxide etch chemistry methods. Dry etching processes, i.e. formic acid vapor
Thermocompression_bonding
Semiconductor material, a surface modification of silicon
ion etching (RIE). Other methods for forming a similar structure include electrochemical etching, stain etching, metal-assisted chemical etching, and
Black_silicon
American chemical engineer
scientist known for her research developing advanced atomic layer deposition (ALD) and etching techniques. Her research focuses on creating thin films
Jane_P._Chang
Spectroscopic technique
composition across the surface, or for depth profiling when paired with ion-beam etching. It is often applied to study chemical processes in the materials in their
X-ray photoelectron spectroscopy
X-ray_photoelectron_spectroscopy
Type of plasma source
fluorocarbon etching of silicon in an inductively coupled plasma: Mechanism of etching through a thick steady state fluorocarbon layer Archived 2016-02-07
Inductively_coupled_plasma
bonding Reactive ion etching Tommi Kääriäinen; David Cameron; Marja-Leena Kääriäinen; Arthur Sherman (17 May 2013). Atomic Layer Deposition: Principles
Remote_plasma
Instrument used to physically scan the surface of a sample
single atoms yields specific atomic configuration at the probe tip, which yields very high resolution. Electrochemical etching is one of the most widely
Probe_tip
Emission of surface atoms through energetic particle bombardment
to act on extremely fine layers of material is utilised in science and industry—there, it is used to perform precise etching, carry out analytical techniques
Sputtering
Hydrodynamic bearings using spiral grooves to develop lubricant pressure
This method differs from regular etching as two layers are placed on the surface to be grooved, but only the upper layer is exposed to the etchant, leaving
Spiral_groove_bearing
Trails created by swift heavy ions penetrating through solids
cross-linking (dominating in the track halo). Low atomic mobility: For selective ion track etching, the density contrast between the latent ion track
Ion_track
wafer processing steps from the creation of metal interconnect layers through the final etching step that creates pad openings (see also front end of line
Glossary of microelectronics manufacturing terms
Glossary_of_microelectronics_manufacturing_terms
Crystal growth process relative to the substrate used as seed
source gas, liberated by evaporation or wet etching of the surface, may also diffuse into the epitaxial layer and cause autodoping. The concentration of
Epitaxy
Lithography using 13.5 nm UV light
electron beam. Etching must be done only in the absorbing layer and thus there is a need to distinguish between the capping and the absorbing layer, which is
Extreme ultraviolet lithography
Extreme_ultraviolet_lithography
Use of nanotechnology to improve lithium-ion batteries
Another approach to coating is ALD which coats the substrate layer-by-layer with atomic precision. The precision is because reactions are confined to
Nanoarchitectures for lithium-ion batteries
Nanoarchitectures_for_lithium-ion_batteries
Diode that emits light from an organic compound
surface. Photolithography and etching removes some polymer layers to uncover conductive pads on the ICs. Afterwards, the anode layer is applied to the device
OLED
Hexagonal lattice made of carbon atoms
graphite. The study measured flakes as small as ~0.4 nm, which is around 3 atomic layers of amorphous carbon. This was the best possible resolution for TEMs
Graphene
few-layer boron nitride sheets have a strength similar to that of monolayer boron nitride. Thermal conductivity. The thermal conductivity of atomically thin
Boron_nitride_nanosheet
clean silicon. To remove existing native oxide layers wet chemical etching (HF clean), dry chemical etching or chemical vapor deposition (CVD) with different
Eutectic_bonding
the ablation of the surface layer by electrochemical etching. The wafers that meet the requirements are put into atomic contact. As soon as contact is
Anodic_bonding
Reduction in ductility of a metal exposed to hydrogen
types of sources: gaseous dihydrogen and atomic hydrogen chemically generated at the metal surface. Atomic hydrogen dissolves quickly into the metal
Hydrogen_embrittlement
Vaporizing laser beam in a vacuum chamber
and growth can be affected by the surface preparation (such as chemical etching), the miscut of the substrate, as well as the roughness of the substrate
Pulsed_laser_deposition
interfaces at atomic or molecular scales. Electrochemical reactions occur in electrolytic solutions—for example electroplating, etching, batteries, and
Electrochemical scanning tunneling microscope
Electrochemical_scanning_tunneling_microscope
Material of moderate electrical conductivity
photoresist layer from the previous step can now be etched. The main process typically used today is called plasma etching. Plasma etching usually involves
Semiconductor
Light-sensitive material used in making electronics
off the substrate, some features will be missing or damaged. Etching resistance Anti-etching is the ability of a photoresist to resist the high temperature
Photoresist
Imaging and diffraction using electrons that pass through samples
Ion etching by argon gas has been recently shown to be able to file down MTJ stack structures to a specific layer which has then been atomically resolved
Transmission electron microscopy
Transmission_electron_microscopy
Technology with features near one nanometer
microscopy. Atomic force microscope tips can be used as a nanoscale "write head" to deposit a resist, which is then followed by an etching process to remove
Nanotechnology
Chemical element with atomic number 55 (Cs)
cesium in American English) is a chemical element; it has symbol Cs and atomic number 55. It is a soft, silvery-golden alkali metal with a melting point
Caesium
Chemical element with atomic number 14 (Si)
(/ˈsɪl.ɪ.kən/, SILL-ih-kən) is a chemical element; it has symbol Si and atomic number 14. It is a hard, brittle crystalline solid with a blue-grey metallic
Silicon
Periodic structure of layers of two or more materials
epitaxy (MBE) and sputtering. With these methods, layers can be produced with thicknesses of only a few atomic spacings. An example of specifying a superlattice
Superlattice
Wafer bond with glass central layer
irregularities, convenient for bonding wafers with a high roughness due to plasma etching or deposition. A low viscosity promotes hermetically sealed encapsulation
Glass_frit_bonding
Devices using beams of free electrons
a thin film of high-purity material. Film thicknesses from a single atomic layer to many micrometers can be achieved. This technique is used in microelectronics
Electron-beam_technology
Chemical compound
search' to see pages Ye, Peide D.; Xuan, Yi; Wu, Yanqing; Xu, Min (2010). "Atomic-Layer Deposited High-k/III-V Metal-Oxide-Semiconductor Devices and Correlated
Gallium_arsenide
Solid metallic material with disordered atomic-scale structure
metal) is a solid metallic material, usually an alloy, with disordered atomic-scale structure. Most metals are crystalline in their solid state, which
Amorphous_metal
Small, local deviations of a surface from a perfectly flat ideal
electrical discharge machining (EDM), milling, lithography, industrial etching/chemical milling, laser texturing, or other processes. Lay is the direction
Surface_finish
Atomic level resolution. Flaw characterization and detection of hidden structures can be done. Quantitative characterization of nano material layers.
Atomic force acoustic microscopy
Atomic_force_acoustic_microscopy
or etching. The vertical nano structures are also created directly on the substrate surface. The substrate surfaces are deposited with a solder layer, i
Reactive_bonding
Beam anchored at only one end
release it, often with an anisotropic wet or dry etching technique. Without cantilever transducers, atomic force microscopy would not be possible. A large
Cantilever
Optical technique for characterizing thin films
yield information about layers that are thinner than the wavelength of the probing light itself, even down to a single atomic layer. Ellipsometry can probe
Ellipsometry
pressure discharge Atmospheric-pressure plasma Atom Atomic emission spectroscopy Atomic physics Atomic-terrace low-angle shadowing Auger electron spectroscopy
List of plasma physics articles
List_of_plasma_physics_articles
Type of atomic force microscopy
atomic force microscopy (PC-AFM) is a variant of atomic force microscopy that measures photoconductivity in addition to surface forces. Multi-layer photovoltaic
Photoconductive atomic force microscopy
Photoconductive_atomic_force_microscopy
Preparation and study of ceramics with optical instruments
be coated with a conductive ~10-nm layer of metal or carbon for electron microscopy, after polishing and etching. Gold or Au-Pd alloy from a sputter
Ceramography
Methods to make single-atom-thick carbon sheets
by plasma etching of nanotubes partly embedded in a polymer film. In applications where the thickness and packing density of graphene layer needs to carefully
Graphene production techniques
Graphene_production_techniques
Periodic optical nanostructure that affects the motion of photons
lithography and dry etching: lithographically formed layers of periodic grooves are stacked by regulated sputter deposition and etching, resulting in "stationary
Photonic_crystal
Nano-scale semiconductor particles
Quantum dots defined by lithographically patterned gate electrodes, or by etching on two-dimensional electron gases in semiconductor heterostructures can
Quantum_dot
Thin slice of semiconductor used for the fabrication of integrated circuits
undergoes many microfabrication processes, such as doping, ion implantation, etching, thin-film deposition of various materials, and photolithographic patterning
Wafer_(electronics)
Type of semiconductor laser diode
interim testing process will flag that the top metal layer is not making contact to the initial metal layer. Additionally, because VCSELs emit the beam perpendicular
Vertical-cavity surface-emitting laser
Vertical-cavity_surface-emitting_laser
Manufacturing processes
Burnishing Electroplating Electropolishing Magnetic field-assisted finishing Etching Linishing Mass finishing Tumbling (barrel finishing) Spindle finishing
List of manufacturing processes
List_of_manufacturing_processes
Chemical compound
single-crystal perovskite films and heterostructures by etching of sacrificial water-soluble layers". Nature Materials. 15 (12): 1255–1260. Bibcode:2016NatMa
Strontium_aluminate
Film infiltration
Sequential infiltration synthesis (SIS) is a technique derived from atomic layer deposition (ALD) in which a polymer is infused with inorganic material
Sequential infiltration synthesis
Sequential_infiltration_synthesis
Linear crystallographic defect or irregularity
locally increases the relative susceptibility of the material to acid etching and an etch pit of regular geometrical format results. In this way, dislocations
Dislocation
Artificial vacuum with very low pressure
as molecular beam epitaxy (MBE), UHV chemical vapor deposition (CVD), atomic layer deposition (ALD) and UHV pulsed laser deposition (PLD) Angle resolved
Ultra-high_vacuum
Class of amorphous carbon material
cases cubic and hexagonal lattices can be randomly intermixed, layer by atomic layer, because there is no time available for one of the crystalline geometries
Diamond-like_carbon
Branch of microscopy
scanning tunneling microscope, an instrument for imaging surfaces at the atomic level. The first successful scanning tunneling microscope experiment was
Scanning_probe_microscopy
Crystalline structure of phosphorus
of crystal thickness. Atomic layer deposition (ALD) dielectric layer and/or hydrophobic polymer is used as encapsulation layers in order to prevent device
Phosphorene
Compounds of carbides and nitrides
generally stiff, lightweight, and plastic at high temperatures. Due to the layered atomic structure of these compounds, some, like Ti3SiC2 and Ti2AlC, are also
MAX_phases
lithography followed by conformal deposition of TiN using atomic layer deposition and a final etching to remove the polymer. An earlier metallic tube lattice
Tube-based_nanostructure
Highly corrosive mineral acid
of nitric acid are exploited for some specialty applications, such as etching in printmaking, pickling stainless steel or cleaning silicon wafers in
Nitric_acid
Collection of bound atoms or molecules
Nanoclusters are atomically precise, crystalline materials most often existing on the 0–2 nanometer scale.[citation needed] They are often considered[by
Nanocluster
Novel type of computer memory
random-access memory" by utilizing electron cyclotron resonance plasma etching. Leon Chua argued that all two-terminal non-volatile memory devices including
Resistive random-access memory
Resistive_random-access_memory
Sensors of light or other electromagnetic energy
improve its characteristics, such as manipulating the vertical structure, etching, changing the substrate, and utilizing plasmonics. The best achievable
Photodetector
Chemical element with atomic number 5 (B)
Boron is a chemical element; it has symbol B and atomic number 5. In its crystalline form it is a brittle, dark, lustrous metalloid; in its amorphous form
Boron
Interface between crystallites in a polycrystalline material
segregation of impurities, which may form a thin layer with a different composition from the bulk and a variety of atomic structures that are distinct from the abutting
Grain_boundary
Chemical element with atomic number 9 (F)
Fluorine is a chemical element; it has symbol F and atomic number 9. It is the lightest halogen and exists at standard conditions as pale yellow diatomic
Fluorine
American inventor and chemist (1930–2025)
education I ever had." Along with his colleagues, Klein worked to develop etching techniques and ways to prevent contamination in the process of semiconductor
Donald_L._Klein
Electrical depth profiling technique
relevant to materials produced today using modern processes such as atomic layer deposition (ALD) and advanced epitaxial growth techniques, which can
Differential Hall Effect Metrology
Differential_Hall_Effect_Metrology
Nanomaterial
and atomic layer deposition (ALD). InGaN/GaN nanorod array light-emitting diodes can be manufactured with dry etching or focused ion beam etching techniques
Nanorod
Biological tissues incorporating minerals
predators by using a two layered system, one of which is nacre. Nacre constitutes the inner layer while the other, outer, layer is made from calcite. The
Mineralized_tissues
Brand of glass
cerium oxides. Foturan can be structured via UV-exposure, tempering and etching: Crystal nucleation grow in Foturan when exposed to UV and heat treated
Foturan
Device
grain morphology can be readily imaged without resorting to chemical etching. Grain boundary contrast can also be enhanced through careful selection
Focused_ion_beam
microscopy, or LEEM, is an analytical surface science technique used to image atomically clean surfaces, atom-surface interactions, and thin (crystalline) films
Low-energy electron microscopy
Low-energy_electron_microscopy
Chemical element with atomic number 40 (Zr)
Zirconium is a chemical element; it has symbol Zr and atomic number 40. First identified in 1789, isolated in impure form in 1824, and manufactured at
Zirconium
Type of electron microscope
thin metal layer on the surface of the sample." This is achieved via vacuum evaporation coating or sputter coating. For elements with atomic numbers 8
Scanning_electron_microscope
offering control of cage wall thickness down to one atomic layer, seed-mediated growth and etching necessitates further reaction steps and more precise
Gold_nanocage
Chemical element with atomic number 22 (Ti)
oxygen-rich metallic surface layer called "alpha case" that worsens the fatigue properties, so it must be removed by milling, etching, or electrochemical treatment
Titanium
for high precision, used in several technologies such as laser ablation, etching and others. Nanomanufacturing differs from molecular manufacturing, which
Nanomanufacturing
Cleaning method using gas
processes, such as piranha etching, which contain dangerous chemicals, increase danger of reagent contamination and risk etching treated surfaces. Removal
Plasma_cleaning
1186/1556-276X-7-277-3479.48780458). Atomically monodispersed and fluorescent sub-nanometer gold clusters by biomolecule-assisted etching of nanometer-sized gold particles
Thiolate-protected gold cluster
Thiolate-protected_gold_cluster
Water purified to uncommonly stringent specifications
that define nanometer-sized features. Particulates can interfere with etching processes and bridge nanometer-scale features in final circuits causing
Ultrapure_water
Accuracy and Success. W. Phillips. p. 479. Apiezon, M&I Materials Limited. "Vacuum Sealing, Mounting and Etching Waxes" (PDF). Retrieved 2024-02-27.
Materials_for_use_in_vacuum
Wafer bonding process in semiconductor production
oxide layer. A hydrophobic surface is generated if the native oxide layer is removed by either plasma treatment or by fluoride containing etching solutions
Direct_bonding
Class of materials
surfaces can be created in a number of different ways including plasma or ion etching, crystal growth on a material surface, and nanolithography to name a few
Self-cleaning_surfaces
Lithographic technique that uses a scanning beam of electrons
that can subsequently be transferred to the substrate material, often by etching. The primary advantage of electron-beam lithography is that it can draw
Electron-beam_lithography
many experiments and many colloids. Nanolithography is the process of etching, writing or printing structures in the range of nanometer. Small amounts
Fluidic_force_microscopy
Dynamics of fluids confined in nanoscale structures
HK, Stemme G, van der Wijngaart W, Roxhed N (2012). "Pt-Al2O3 dual layer atomic layer deposition coating in high aspect ratio nanopores". Nanotechnology
Nanofluidics
Type of microscopic technique used for imaging surfaces by tunneling of photons
fabricated via chemical etching of an optical fiber in a solution of HF and can be apertured or apertureless. Using chemical etching, fiber tips with a curvature
Photon_scanning_microscopy
ATOMIC LAYER-ETCHING
ATOMIC LAYER-ETCHING
Boy/Male
Muslim
Tourist, Who visits holy places
Surname or Lastname
English (Sussex and Kent)
English (Sussex and Kent) : topographic name for someone who lived by a stream, from Old English lacu ‘stream’ (see Lake) + the suffix -er denoting an inhabitant.
Girl/Female
Hindu
The wave
Surname or Lastname
English
English : variant of Ayer.English : topographic name for someone who lived by an enclosure, Middle English hay (see Hay 1) + the suffix -er(e) denoting an inhabitant.French : occupational name for a warder of woodland, from an agent derivative of Old French haye ‘hedge’, ‘enclosed forest’.South German : from an agent derivative of Middle High German heien ‘to guard or protect’, hence an occupational name for a warden of woodland or crops.Indian (Panjab) : Sikh name based on the name of a Jat clan, also called Her.
Boy/Male
Indian
Tourist, Who visits holy places
Boy/Male
German, Welsh
Carpenter
Surname or Lastname
English
English : from the Norman personal name Raher, composed of the Germanic elements rad ‘counsel’, ‘advice’ + hari, heri ‘army’.French : occupational name for a barber, Old French raier (from rère ‘to shave’).
Male
Yiddish
(לֵייזֶער) Yiddish form of Hebrew Elazar, LAZER means "my God has helped."
Surname or Lastname
English
English : status name for a mayor, Middle English, Old French mair(e) (from Latin maior ‘greater’, ‘superior’; compare Mayor). In France the title denoted various minor local officials, and the same is true of Scotland (see Mair 1). In England, however, the term was normally restricted to the chief officer of a borough, and the surname may have been given not only to a citizen of some standing who had held this office, but also as a nickname to a pompous or officious person.German and Dutch : variant of Meyer 1.Jewish (Ashkenazic) : variant of Meyer 2.
Boy/Male
American, Australian, British, English, German, Hebrew, Latin
Headman; Mayor; Farmer; Bringer of Light; Greater
Surname or Lastname
English
English : occupational name for a washerman, Anglo-Norman French laver (an agent derivative of Old French laver ‘to wash’, Latin lavare).English : habitational name from High, Little or Magdalen Laver in Essex, named from Old English lagu ‘flood’, ‘water’ + fær ‘passage’, ‘crossing’.English : topographic name for someone living where bulrushes or irises grew, Old English lǣfer.
Surname or Lastname
English
English : habitational name from any of three places in Essex – Layer Breton, Layer de la Haye, and Layer Marney – all named from a river name, Leire, or from Leire in Leicestershire, also named from an identical river name. The river name is of Celtic origin and is probably the base of the tribal name Ligore, found in the place name Leicester.English : nickname or status name from Anglo-Norman French le eyr ‘the heir’. Compare Ayer.English : occupational name for a stone layer, Middle English leyer; the job of the layer was to position the stones worked by the masons.German : habitational name for someone from any of the various placed named Lay, in the Rhineland and Bavaria.
Surname or Lastname
English
English : from an agent derivative of Middle English pleyen ‘to play’, hence an occupational name for an actor or musician or a nickname for a successful competitor in contests of athletic or sporting prowess.
Surname or Lastname
English
English : occupational name for a maker of cord and string, derived from Middle English lace ‘cord’ (Old French laz, las).
Surname or Lastname
Jewish (eastern Ashkenazic)
Jewish (eastern Ashkenazic) : ornamental name from Yiddish fayer ‘fire’ or Yiddishized form of Feuer.English : variant of Fair.
Boy/Male
Latin English German
Great.
Girl/Female
Hindu, Indian
Wave; Flow
Boy/Male
Australian, Hebrew, Irish
God has Helped
Male
Japanese
(富) Japanese name TOMIO means "treasured man."
Surname or Lastname
English
English : from the Middle English personal name Saher or Seir. This is probably a Norman introduction of the Continental Germanic personal name Sigiheri, composed of the elements sigi ‘victory’ + heri ‘army’. However, it could also represent a Middle English survival of an unrecorded Old English name, SÇ£here, composed of the elements sÇ£ ‘sea’ + here ‘army’.English : occupational name, from Middle English saghier (see Sawyer) or Old French seieor.English : occupational name for a professional reciter, from an agent derivative of Middle English say(en), sey(en) ‘to say’.English : from a reduced form of Middle English assayer, an agent derivative of assay ‘trial’, ‘test’, Old French essay (from Late Latin exagium, a derivative of exagminÄre ‘to weigh’), hence an occupational name for an assayer of metals or a taster of food.English : occupational name for a maker or seller of say, a type of cloth, from Middle English say + the agent suffix -er. See also Say.Welsh : occupational name from Welsh saer ‘carpenter’ or from saer maen ‘stonecutter’, i.e. mason.French : occupational name for a reaper or mower, from an agent derivative of Old French seer ‘to cut’ (Latin secare).Dutch : occupational name for a weaver of serge, from an agent derivative of saai ‘serge’.Dutch : occupational name from zaaier ‘sower’.
ATOMIC LAYER-ETCHING
ATOMIC LAYER-ETCHING
Boy/Male
Hindu
Lord of Dharma
Boy/Male
Hebrew, Hindu, Indian, Russian
Hypnotising
Boy/Male
Hindu, Indian
God who is Fond of Devotees
Girl/Female
Hindu
River
Girl/Female
Muslim/Islamic
Bright
Boy/Male
Gujarati, Hindu, Indian, Jain, Kannada, Telugu
The Sound from Heaven
Boy/Male
Sikh
Meditation on lords word, Remembering gods friend
Boy/Male
Hindu
Pleasing
Boy/Male
Tamil
An epithet of Krishna
Girl/Female
Bengali, Indian, Modern
One of Three Unity
ATOMIC LAYER-ETCHING
ATOMIC LAYER-ETCHING
ATOMIC LAYER-ETCHING
ATOMIC LAYER-ETCHING
ATOMIC LAYER-ETCHING
n.
The doctrine of atoms. See Atomic philosophy, under Atomic.
a.
Produced without sexual union; as, agamic or unfertilized eggs.
a.
Relating to the etymon; as, an etymic word.
a.
Alt. of Atomical
a.
Containing two atoms.
a.
Pertaining to, or characterized by, aptotes; uninflected; as, aptotic languages.
a.
Unaccented; as, an atonic syllable.
a.
Aeolian, 1; as, the Aeolic dialect; the Aeolic mode.
a.
Pertaining to azote, or nitrogen; formed or consisting of azote; nitric; as, azotic gas; azotic acid.
a.
Characterized by atony, or want of vital energy; as, an atonic disease.
n.
One who holds to the atomic philosophy or theory.
n.
A lawyer.
a.
Of or pertaining to atoms.
n.
Nomic spelling.
n.
An Adonic verse.
n.
Lager beer.
n.
Degree of atomic attraction; equivalence; valence; also (a later use) the number of atoms in an elementary molecule. See Valence.
n.
The fronds of certain marine algae used as food, and for making a sauce called laver sauce. Green laver is the Ulva latissima; purple laver, Porphyra laciniata and P. vulgaris. It is prepared by stewing, either alone or with other vegetables, and with various condiments; -- called also sloke, or sloakan.
n.
That which is laid; a stratum; a bed; one thickness, course, or fold laid over another; as, a layer of clay or of sand in the earth; a layer of bricks, or of plaster; the layers of an onion.
a.
Having two replaceable atoms or radicals.