Acronym/Abbreviation meaning of LPCVD (Chemistry)

The acronym LPCVD(Chemistry) means : Low Pressure Chemical Vapor Deposition

Acronyms, abbreviations and meanings similar to LPCVD

Low Pressure Chemical Vapor Deposition

Low Pressure Chemical Vapor Deposition

Low Pressure Chemical Vapor Deposition

Famous / Popular results for LPCVD

Chemical vapor deposition

Atmospheric pressure CVD (APCVD) – CVD at atmospheric pressure. Low-pressure CVD (LPCVD) – CVD at sub-atmospheric pressures. Reduced pressures tend to reduce unwanted

Low-temperature polycrystalline silicon

Silicon film is synthesized by low-pressure chemical vapor deposition (LPCVD) to minimize surface roughness. First, amorphous silicon is deposited at

Dichlorosilane

the formula H2SiCl2. In its major use, it is mixed with ammonia (NH3) in LPCVD chambers to grow silicon nitride in semiconductor processing. A higher concentration

Tetramethylammonium hydroxide

Common masking materials for long etches in TMAH include silicon dioxide (LPCVD and thermal) and silicon nitride. Silicon nitride has a negligible etch

Silicon nitride

substrates, two methods are used: Low pressure chemical vapor deposition (LPCVD) technology, which works at rather high temperature and is done either in

Silicon dioxide

Hazards Formation of silicon oxide layers in the semiconductor industry. LPCVD and PECVD method in comparison. Stress prevention. Quartz SiO2 piezoelectric

Polycrystalline silicon

technologies it is deposited using low-pressure chemical-vapour deposition (LPCVD) reactors at high temperatures and is usually heavily doped n-type or p-type

Thermal oxidation

Willemsen, J. M. G. Bax, and F. H. P. H. Habraken, “Oxidation behaviour of LPCVD silicon oxynitride films,” Applied Surface Science, vol. 33, no. 34, pp

Tokyo Electron

silicon wafer surface in a heated low-pressure chemical vapor deposition (LPCVD) or oxidation process Photoresist coating/developing Photoresist coating

Capacitive micromachined ultrasonic transducer

compared to the traditional way. The structural membrane is in silicon-nitride LPCVD, but the entire process is low-temperature, so it is CMOS-compatible. There

Chemical vapor deposition

Atmospheric pressure CVD (APCVD) – CVD at atmospheric pressure. Low-pressure CVD (LPCVD) – CVD at sub-atmospheric pressures. Reduced pressures tend to reduce unwanted

Low-temperature polycrystalline silicon

Silicon film is synthesized by low-pressure chemical vapor deposition (LPCVD) to minimize surface roughness. First, amorphous silicon is deposited at

Dichlorosilane

the formula H2SiCl2. In its major use, it is mixed with ammonia (NH3) in LPCVD chambers to grow silicon nitride in semiconductor processing. A higher concentration

Tetramethylammonium hydroxide

Common masking materials for long etches in TMAH include silicon dioxide (LPCVD and thermal) and silicon nitride. Silicon nitride has a negligible etch

Silicon nitride

substrates, two methods are used: Low pressure chemical vapor deposition (LPCVD) technology, which works at rather high temperature and is done either in

Silicon dioxide

Hazards Formation of silicon oxide layers in the semiconductor industry. LPCVD and PECVD method in comparison. Stress prevention. Quartz SiO2 piezoelectric

Polycrystalline silicon

technologies it is deposited using low-pressure chemical-vapour deposition (LPCVD) reactors at high temperatures and is usually heavily doped n-type or p-type

Thermal oxidation

Willemsen, J. M. G. Bax, and F. H. P. H. Habraken, “Oxidation behaviour of LPCVD silicon oxynitride films,” Applied Surface Science, vol. 33, no. 34, pp

Tokyo Electron

silicon wafer surface in a heated low-pressure chemical vapor deposition (LPCVD) or oxidation process Photoresist coating/developing Photoresist coating

Capacitive micromachined ultrasonic transducer

compared to the traditional way. The structural membrane is in silicon-nitride LPCVD, but the entire process is low-temperature, so it is CMOS-compatible. There

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Acronyms, abbreviations meanings/definitions and descriptions

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JTA means: Job Table Area

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Meaning of ESMC

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FL means: Flowline

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TTPRR means: Trainer Test Procedures And Results Report (udi-t-25594)

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